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DATE
July 15(Wed) - 17(Fri), 2026
VENUE
Tokyo Big Sight East Hall 2

UV/DUV Multiwavelength Deep-UV In-line Process Spectrophotometer Japan Laser Corporation

  • Analytical & Measurement Equipment
  • Sensors
  • Automation, Monitoring & Control
  • Target Sector (English)

    Quality control and process engineers in pharmaceutical/biomanufacturing; instrumentation and production engineers in chemical, petroleum, and food & beverage plants; operators of chromatography, filtration, and purification processes; GMP-compliant manufacturing line managers; R&D staff exploring Process Analytical Technology (PAT) implementation

  • Use Scenes (English)

    In-line real-time quality monitoring integrated into pharmaceutical and biomanufacturing lines; post-column API detection and fraction collection management in chromatography; monitoring separation efficiency in filtration and centrifugation processes; concentration measurement and purity evaluation of nucleic acids (DNA/RNA) and proteins; yield optimization and anomaly detection (leak/carryover) in batch manufacturing

  • Sales point (English)

    ① In-line, non-sampling measurement: Real-time continuous analysis without stopping the process line—zero sampling loss and contamination risk.
    ② 10-wavelength simultaneous detection across 190–440 nm (Deep-UV): Evaluate protein (280 nm), nucleic acids (260 nm), and impurities with a single unit.
    ③ High dynamic range (0–3 AU) and resolution (±0.005 AU): Accurate measurement from trace to high-concentration components.
    ④ Mercury-free light source with up to 2-year continuous operation: Meets RoHS/REACH requirements while significantly reducing maintenance frequency.
    ⑤ GMP-ready, built-in traceable verification: NIST-traceable standards and an integrated verification port enable compliance checks without interrupting the process line.
    ⑥ PROFINET / EtherNet/IP / Modbus TCP connectivity: Easy integration with existing DCS/SCADA systems for digitalization and smart factory initiatives.
    ⑦ IP65/69 robust design: Resistant to high-pressure cleaning and steam sterilization, suitable for hygienic manufacturing environments.

Size / capacity (English) Compatible line size: Up to DN200 (8 inches)
Process conditions: Temperature up to 275°C, Pressure 10 mbar–200 bar
Protection rating: IP65 (main unit), IP69 (flow cell)
Power supply: PoE (max 13 W), 2× M12 connectors (Ethernet 10/100 PoE+)
Wetted materials: SUS316L, Titanium, Hastelloy C-276/C-22, PTFE, PPSU (selectable)

Japan Laser Corporation

https://www.japanlaser.co.jp/
  • Japan exhibitors
  • Real
  • Plant Show 2026
  • Plant Show
  • Booth number 2-R13